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This automation variant serves to clean quartz glass ampoules to
remove any deposits and pollution of the external wall of the ampoules, which
might have deposited there during the whole of the preceding process periods.
This complex cleaning process is necessary not to obtain falsifications of
measured values in the following trace analysis. Extremely identical,
reproducible prerequisites for the analysis are created by the freely
programmable, automatic operation.
In addition, the cleaning is carried out with very aggressive
media. The baths contain the following substances: Hydrofluoric acid 40%, water,
ethyl alcohol and acetone. The pieces coming into contact with the liquids are
manufactured from teflon. With the RAQ -10, the manual activity is limited to
the equipment of a magazine with quartz ampoules and its attachment in the
machine.
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